JPH0244327U - - Google Patents

Info

Publication number
JPH0244327U
JPH0244327U JP12307088U JP12307088U JPH0244327U JP H0244327 U JPH0244327 U JP H0244327U JP 12307088 U JP12307088 U JP 12307088U JP 12307088 U JP12307088 U JP 12307088U JP H0244327 U JPH0244327 U JP H0244327U
Authority
JP
Japan
Prior art keywords
liquid
suction
plate
gas injection
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12307088U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12307088U priority Critical patent/JPH0244327U/ja
Publication of JPH0244327U publication Critical patent/JPH0244327U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Solid Materials (AREA)
JP12307088U 1988-09-20 1988-09-20 Pending JPH0244327U (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12307088U JPH0244327U (en]) 1988-09-20 1988-09-20

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12307088U JPH0244327U (en]) 1988-09-20 1988-09-20

Publications (1)

Publication Number Publication Date
JPH0244327U true JPH0244327U (en]) 1990-03-27

Family

ID=31371589

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12307088U Pending JPH0244327U (en]) 1988-09-20 1988-09-20

Country Status (1)

Country Link
JP (1) JPH0244327U (en])

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100412486C (zh) * 2003-06-27 2008-08-20 东京応化工业株式会社 基板干燥装置和基板干燥方法
JP2010181761A (ja) * 2009-02-09 2010-08-19 Hitachi High-Technologies Corp 基板乾燥装置、基板乾燥方法、及び表示用パネル基板の製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100412486C (zh) * 2003-06-27 2008-08-20 东京応化工业株式会社 基板干燥装置和基板干燥方法
JP2010181761A (ja) * 2009-02-09 2010-08-19 Hitachi High-Technologies Corp 基板乾燥装置、基板乾燥方法、及び表示用パネル基板の製造方法

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